JPS6220277B2 - - Google Patents

Info

Publication number
JPS6220277B2
JPS6220277B2 JP54137895A JP13789579A JPS6220277B2 JP S6220277 B2 JPS6220277 B2 JP S6220277B2 JP 54137895 A JP54137895 A JP 54137895A JP 13789579 A JP13789579 A JP 13789579A JP S6220277 B2 JPS6220277 B2 JP S6220277B2
Authority
JP
Japan
Prior art keywords
copper
metal
nickel
alkali metal
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54137895A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5562156A (en
Inventor
Yurugen Eeritsuhi Hansu
Maaruko Harutomuuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bayer Pharma AG
Original Assignee
Schering AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schering AG filed Critical Schering AG
Publication of JPS5562156A publication Critical patent/JPS5562156A/ja
Publication of JPS6220277B2 publication Critical patent/JPS6220277B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/185Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1612Process or apparatus coating on selected surface areas by direct patterning through irradiation means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Laminated Bodies (AREA)
JP13789579A 1978-10-27 1979-10-26 Manufacture of metal pattern on electric insulating supporter by photochemical method Granted JPS5562156A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782847298 DE2847298A1 (de) 1978-10-27 1978-10-27 Verfahren zur herstellung von metallmustern auf einem isolierenden traegerstoff

Publications (2)

Publication Number Publication Date
JPS5562156A JPS5562156A (en) 1980-05-10
JPS6220277B2 true JPS6220277B2 (en]) 1987-05-06

Family

ID=6053554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13789579A Granted JPS5562156A (en) 1978-10-27 1979-10-26 Manufacture of metal pattern on electric insulating supporter by photochemical method

Country Status (12)

Country Link
US (1) US4262085A (en])
JP (1) JPS5562156A (en])
AT (1) AT376865B (en])
BE (1) BE879669A (en])
CH (1) CH645495A5 (en])
DE (1) DE2847298A1 (en])
FR (1) FR2440139A1 (en])
GB (1) GB2037447B (en])
IT (1) IT1124657B (en])
NL (1) NL7907420A (en])
SE (1) SE440440B (en])
SU (1) SU1179936A3 (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01119982U (en]) * 1988-02-09 1989-08-14

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4532152A (en) * 1982-03-05 1985-07-30 Elarde Vito D Fabrication of a printed circuit board with metal-filled channels
US4560643A (en) * 1982-11-25 1985-12-24 Ciba Geigy Corporation Use of photosensitive compositions of matter for electroless deposition of metals
EP0112798B1 (de) * 1982-11-25 1987-05-13 Ciba-Geigy Ag Zu Kondensations- oder Additionsreaktionen befähigte lichtempfindliche und gegebenenfalls vernetzbare Stoffgemische, daraus herstellbare Reaktionsprodukte und deren Verwendung
JPS60149782A (ja) * 1984-01-17 1985-08-07 Inoue Japax Res Inc 選択的メツキ方法
JPS60149783A (ja) * 1984-01-17 1985-08-07 Inoue Japax Res Inc 選択的メツキ方法
DE3571545D1 (en) * 1984-09-19 1989-08-17 Bayer Ag Method of partially activating a substrate surfaces
US4594311A (en) * 1984-10-29 1986-06-10 Kollmorgen Technologies Corporation Process for the photoselective metallization on non-conductive plastic base materials
JPS62130283A (ja) * 1985-12-02 1987-06-12 Tanaka Kikinzoku Kogyo Kk セラミツク基板へのCuコ−テイング方法
US5007990A (en) * 1987-07-10 1991-04-16 Shipley Company Inc. Electroplating process
US5380560A (en) * 1992-07-28 1995-01-10 International Business Machines Corporation Palladium sulfate solution for the selective seeding of the metal interconnections on polyimide dielectrics for electroless metal deposition
JP2737599B2 (ja) * 1993-04-27 1998-04-08 上村工業株式会社 プリント配線板の銅回路パターン上への無電解めっき方法
US5882736A (en) * 1993-05-13 1999-03-16 Atotech Deutschland Gmbh palladium layers deposition process
US6265075B1 (en) 1999-07-20 2001-07-24 International Business Machines Corporation Circuitized semiconductor structure and method for producing such
US20040126548A1 (en) * 2001-05-28 2004-07-01 Waseda University ULSI wiring and method of manufacturing the same

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3942983A (en) * 1967-06-09 1976-03-09 Minnesota Mining And Manufacturing Company Electroless deposition of a non-noble metal on light generated nuclei of a metal more noble than silver
US3904783A (en) * 1970-11-11 1975-09-09 Nippon Telegraph & Telephone Method for forming a printed circuit
GB1338497A (en) * 1970-11-11 1973-11-21 Nippon Telegraph & Telephone Photochemical method for forming a metal image
CA968908A (en) * 1971-07-29 1975-06-10 Photocircuits Division Of Kollmorgen Corporation Sensitized substrates for chemical metallization
US3993802A (en) * 1971-07-29 1976-11-23 Photocircuits Division Of Kollmorgen Corporation Processes and products for making articles for electroless plating
US3772056A (en) * 1971-07-29 1973-11-13 Kollmorgen Photocircuits Sensitized substrates for chemical metallization
US3994727A (en) * 1971-07-29 1976-11-30 Photocircuits Divison Of Kollmorgen Corporation Formation of metal images using reducible non-noble metal salts and light sensitive reducing agents
US3962494A (en) * 1971-07-29 1976-06-08 Photocircuits Division Of Kollmorgan Corporation Sensitized substrates for chemical metallization
US3959547A (en) * 1971-07-29 1976-05-25 Photocircuits Division Of Kollmorgen Corporation Process for the formation of real images and products produced thereby
US3783005A (en) * 1972-02-04 1974-01-01 Western Electric Co Method of depositing a metal on a surface of a nonconductive substrate
US3791340A (en) * 1972-05-15 1974-02-12 Western Electric Co Method of depositing a metal pattern on a surface
US3959523A (en) * 1973-12-14 1976-05-25 Macdermid Incorporated Additive printed circuit boards and method of manufacture
US3950570A (en) * 1974-05-02 1976-04-13 Western Electric Company, Inc. Method of depositing a metal on a surface
US3928670A (en) * 1974-09-23 1975-12-23 Amp Inc Selective plating on non-metallic surfaces
GB1499552A (en) 1975-08-12 1978-02-01 Ici Ltd Production of electrically conductive paths on an insulating substrate
GB1500435A (en) * 1976-03-23 1978-02-08 Canning & Co Ltd W Electroless copper plating solution
US4084023A (en) * 1976-08-16 1978-04-11 Western Electric Company, Inc. Method for depositing a metal on a surface
JPS5355776A (en) * 1976-10-30 1978-05-20 Hitachi Chemical Co Ltd Method of producing printed board terminal
US4096043A (en) * 1977-07-11 1978-06-20 Western Electric Company, Inc. Method of selectively depositing a metal on a surface of a substrate
US4133908A (en) * 1977-11-03 1979-01-09 Western Electric Company, Inc. Method for depositing a metal on a surface

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01119982U (en]) * 1988-02-09 1989-08-14

Also Published As

Publication number Publication date
FR2440139B1 (en]) 1983-11-10
NL7907420A (nl) 1980-04-29
JPS5562156A (en) 1980-05-10
ATA691779A (de) 1984-05-15
BE879669A (fr) 1980-04-28
SU1179936A3 (ru) 1985-09-15
US4262085A (en) 1981-04-14
DE2847298C2 (en]) 1989-10-05
DE2847298A1 (de) 1980-05-08
SE440440B (sv) 1985-07-29
CH645495A5 (de) 1984-09-28
GB2037447B (en) 1983-02-09
SE7908764L (sv) 1980-04-28
IT7926809A0 (it) 1979-10-26
GB2037447A (en) 1980-07-09
FR2440139A1 (fr) 1980-05-23
IT1124657B (it) 1986-05-14
AT376865B (de) 1985-01-10

Similar Documents

Publication Publication Date Title
JPS6220277B2 (en])
US3269861A (en) Method for electroless copper plating
US5250105A (en) Selective process for printing circuit board manufacturing
JP2883445B2 (ja) レジスト付きスルーホールめっき印刷回路基板およびその製造方法
US7056448B2 (en) Method for forming circuit pattern
KR100188481B1 (ko) 유전기질과 도금기질을 직접 전기도금 하는 방법
CA1229266A (en) Process for preparing a substrate for subsequent electroless deposition of a metal
JPH0533554B2 (en])
KR890003347B1 (ko) 표면상에 금속을 침착시키는 방법
JPH0544075A (ja) 無電解銅めつき代替銅ストライクめつき方法
CA1069367A (en) Plating solution containing an inorganic redox couple and a complexing agent for cuprous ions
JPS6252480B2 (en])
JP3337802B2 (ja) 酸化銅(i)コロイドの金属化によるダイレクトプレーティング方法
JP3314967B2 (ja) 置換めっき浴の寿命を延長させる方法
JPS60206085A (ja) プリント回路板の製造法
JPH06330378A (ja) 非導電性材料表面に電気めっき層を直接形成する方法
JPS6257120B2 (en])
US6852152B2 (en) Colloidal seed formulation for printed circuit board metallization
US5770032A (en) Metallizing process
EP0098472B1 (en) Method for decreasing plated metal defects by treating a metallic surface
US3892635A (en) Pre-conditioner and process
JP4000225B2 (ja) 多層プリント配線板の製造方法
JP2014015672A (ja) 積層体およびその製造方法、並びに、下地層形成用組成物
JP3857564B2 (ja) 樹脂表面への導電性被膜及び導電性回路パターンの形成方法
US4748056A (en) Process and composition for sensitizing articles for metallization